The Resource Micro- and nanopatterning polymers, Hiroshi Ito, editor ... [et al.], (electronic resource)

Micro- and nanopatterning polymers, Hiroshi Ito, editor ... [et al.], (electronic resource)

Label
Micro- and nanopatterning polymers
Title
Micro- and nanopatterning polymers
Statement of responsibility
Hiroshi Ito, editor ... [et al.]
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
MUU
Illustrations
illustrations
Index
index present
LC call number
TK7871.15.P6
LC item number
M517 1998
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1997 :
http://library.link/vocab/relatedWorkOrContributorName
  • Ito, Hiroshi
  • American Chemical Society
  • American Chemical Society
Series statement
ACS symposium series
Series volume
706
http://library.link/vocab/subjectName
  • Microelectronics
  • Polymeric composites
  • Photoresists
Label
Micro- and nanopatterning polymers, Hiroshi Ito, editor ... [et al.], (electronic resource)
Link
http://libraries.ou.edu/access.aspx?url=http://dx.doi.org/10.1021/bk-1998-0706
Instantiates
Publication
Note
  • Title from PDF title page (ACS publications, viewed Aug 24, 2009)
  • "Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 214th ACS National Meeting, Las Vegas, Nevada, September 7-11, 1997."
Bibliography note
Includes bibliographical references and indexes
Contents
Lithography with a pattern of block copolymer microdomains as a positive or negative resist / Christopher Harrison, Miri Park, Paul M. Chaikin, Richard A. Register, and Douglas H. Adamson -- Inorganic nanostructures on surfaces using micellar diblock copolymer templates / Joachim P. Spatz, Thomas Herzog, Stefan Mössmer, Paul Ziemann, and Martin Möller -- Synthesis of stereoregular polymers as precursors to highly conducting carbon for use in applications in micro- and nanolithography / C.B. Gorman, R.W. Vest, J.L. Snover, T.L. Utz, and S.A. Serron -- Metallization on poly(tetrafluoroethylene) substrate by excimer-laser-induced surface reaction and chemical plating / Hiroyuki Niino and Akira Yabe -- An inorganic approach to photolithography : the photolithographic deposition of dielectric metal oxide films / Ross H. Hill and Sharon L. Blair -- Molding of polymeric microstructures / T. Hanemann, V. Piotter, R. Ruprecht, and J.H. Hausselt -- Acid labile cross-linked units : a concept for improved positive deep-UV photoresists / H.-T. Schacht, P. Falcigno, N. Münzel, R. Schulz, and A. Medina -- Chemistry of ketal resist system and its lithographic performance / Wu-Song Huang, Kim Y. Lee, Rao Bantu, Ranee Kwong, Ahmad Katnani, Mahmoud Khojasteh, William Brunsvold, Steven Holmes, Ronald Nunes, Tsuyoshi Shibata, George Orsula, James Cameron, Dominic Yang, and Roger Sinta -- Photoacid diffusion in chemically amplified DUV resists / Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, and Kunihiko Kasama -- Highly photosensitive diazo compounds as photoacid generators for chemically amplified resists / Kieko Harada, Masahito Kushida, Kyoichi Saito, Kazuyuki Sugita, and Hirotada Iida -- Exploration of chemically amplified resist mechanisms and performance at small linewidths / James W. Taylor, Paul M. Dentinger, Steven J. Rhyner, and Geoffrey W. Reynolds -- The preparation and investigation of macromolecular architectures for microlithography by "living" free radical polymerization / G.G. Barclay, M. King, A. Orellana, P.R.L. Malenfant, R. Sinta, E. Malmstrom, H. Ito, and C.J. Hawker -- Acid proliferation reactions and their application to chemically amplified lithographic imaging / Kunihiro Ichimura, Koji Arimitsu, Soh Noguchi, and Kazuaki Kudo -- Deprotection kinetics of alicyclic polymer resist systems designed for ArF (193 nm) lithography / Uzodinma Okoroanyanwu, Jeffrey D. Byers, Ti Cao, Stephen E. Webber, and C. Grant Willson -- 193 nm single layer resist based on poly(norbornene-alt-maleic anhydride) derivatives : the interplay of the chemical structure of components and lithographic properties / F.M. Houlihan, A. Timko, R. Hutton, R. Cirelli, J.M. Kometani, Elsa Reichmanis, and O. Nalamasu -- Synthesis and evaluation of alicyclic backbone polymers for 193 nm lithography / Hiroshi Ito, Norbert Seehof, Rikiya Sato, Tomonari Nakayama, and Mitsuru Ueda -- Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists / Robert D. Allen, Juliann Opitz, Carl E. Larson, Thomas I. Wallow, Richard A. DiPietro, Gregory Breyta, Ratnam Sooriyakumaran, and Donald C. Hofer -- Calixarene and dendrimer as novel photoresist materials / Osamu Haba, Daisuke Takahashi, Kohji Haga, Yoshimasa Sakai, Tomonari Nakayama, and Mitsuru Ueda -- Calixarene resists for nanolithography / Yoshitake Ohnishi, Naoko Wamme, and Jun-ichi Fujita -- Design and preliminary studies of environmentally enhanced water-castable, water-developable positive tone resists : model and feasibility studies / Jennifer M. Havard, Dario Pasini, Jean M.J. Fréchet, David Medeiros, Shintaro Yamada, and C. Grant Willson -- Molecular design for new positive electron-beam resists / Yukio Nagasaki -- The influence of structure on dissolution inhibition for novolac-based photoresists : adaption of the probabilistic approach / Christopher L. McAdams, Wang Yueh, Pavlos Tsiartas, Dale Hsieh, and C. Grant Willson -- Photoacid generating polymers for surface modification resists / Masamitsu Shirai, Mitsuho Masuda, Masahiro Tsunooka, Masayuki Endo, and Takahiro Matsuo -- Material design and development for aqueous base compatible high-performance deep UV negative-tone resists / Pushkara Rao Varanasi, Hiroshi Ito, Phil Brock, Gregory Breyta, William R. Brunsvold, and Ahmad D. Katnani -- Advanced chemically amplified resist process using non-ammonia generating adhesion promoter / M. Endo and A. Katsuyama -- Post-exposure bake kinetics in epoxy novolac-based chemically amplified resists / P. Argitis, S. Boyatzis, I. Raptis, N. Glezos, and M. Hatzakis -- Alkali-developable positive-photosensitive polyimide based on diazonaphthoquinone sensitizer / T. Ueno, Y. Okabe, T. Miwa, Y. Maekawa, and G. Rames-Langlade
Extent
1 online resource (xii, 386 p.)
Form of item
electronic
Isbn
9780841216884
Isbn Type
(ebook)
Other physical details
ill.
Specific material designation
remote
System control number
  • 3520812-01okla_normanlaw
  • (SIRSI)3520812
  • (Sirsi) o433052835
  • (OCoLC)433052835
Label
Micro- and nanopatterning polymers, Hiroshi Ito, editor ... [et al.], (electronic resource)
Link
http://libraries.ou.edu/access.aspx?url=http://dx.doi.org/10.1021/bk-1998-0706
Publication
Note
  • Title from PDF title page (ACS publications, viewed Aug 24, 2009)
  • "Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 214th ACS National Meeting, Las Vegas, Nevada, September 7-11, 1997."
Bibliography note
Includes bibliographical references and indexes
Contents
Lithography with a pattern of block copolymer microdomains as a positive or negative resist / Christopher Harrison, Miri Park, Paul M. Chaikin, Richard A. Register, and Douglas H. Adamson -- Inorganic nanostructures on surfaces using micellar diblock copolymer templates / Joachim P. Spatz, Thomas Herzog, Stefan Mössmer, Paul Ziemann, and Martin Möller -- Synthesis of stereoregular polymers as precursors to highly conducting carbon for use in applications in micro- and nanolithography / C.B. Gorman, R.W. Vest, J.L. Snover, T.L. Utz, and S.A. Serron -- Metallization on poly(tetrafluoroethylene) substrate by excimer-laser-induced surface reaction and chemical plating / Hiroyuki Niino and Akira Yabe -- An inorganic approach to photolithography : the photolithographic deposition of dielectric metal oxide films / Ross H. Hill and Sharon L. Blair -- Molding of polymeric microstructures / T. Hanemann, V. Piotter, R. Ruprecht, and J.H. Hausselt -- Acid labile cross-linked units : a concept for improved positive deep-UV photoresists / H.-T. Schacht, P. Falcigno, N. Münzel, R. Schulz, and A. Medina -- Chemistry of ketal resist system and its lithographic performance / Wu-Song Huang, Kim Y. Lee, Rao Bantu, Ranee Kwong, Ahmad Katnani, Mahmoud Khojasteh, William Brunsvold, Steven Holmes, Ronald Nunes, Tsuyoshi Shibata, George Orsula, James Cameron, Dominic Yang, and Roger Sinta -- Photoacid diffusion in chemically amplified DUV resists / Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, and Kunihiko Kasama -- Highly photosensitive diazo compounds as photoacid generators for chemically amplified resists / Kieko Harada, Masahito Kushida, Kyoichi Saito, Kazuyuki Sugita, and Hirotada Iida -- Exploration of chemically amplified resist mechanisms and performance at small linewidths / James W. Taylor, Paul M. Dentinger, Steven J. Rhyner, and Geoffrey W. Reynolds -- The preparation and investigation of macromolecular architectures for microlithography by "living" free radical polymerization / G.G. Barclay, M. King, A. Orellana, P.R.L. Malenfant, R. Sinta, E. Malmstrom, H. Ito, and C.J. Hawker -- Acid proliferation reactions and their application to chemically amplified lithographic imaging / Kunihiro Ichimura, Koji Arimitsu, Soh Noguchi, and Kazuaki Kudo -- Deprotection kinetics of alicyclic polymer resist systems designed for ArF (193 nm) lithography / Uzodinma Okoroanyanwu, Jeffrey D. Byers, Ti Cao, Stephen E. Webber, and C. Grant Willson -- 193 nm single layer resist based on poly(norbornene-alt-maleic anhydride) derivatives : the interplay of the chemical structure of components and lithographic properties / F.M. Houlihan, A. Timko, R. Hutton, R. Cirelli, J.M. Kometani, Elsa Reichmanis, and O. Nalamasu -- Synthesis and evaluation of alicyclic backbone polymers for 193 nm lithography / Hiroshi Ito, Norbert Seehof, Rikiya Sato, Tomonari Nakayama, and Mitsuru Ueda -- Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists / Robert D. Allen, Juliann Opitz, Carl E. Larson, Thomas I. Wallow, Richard A. DiPietro, Gregory Breyta, Ratnam Sooriyakumaran, and Donald C. Hofer -- Calixarene and dendrimer as novel photoresist materials / Osamu Haba, Daisuke Takahashi, Kohji Haga, Yoshimasa Sakai, Tomonari Nakayama, and Mitsuru Ueda -- Calixarene resists for nanolithography / Yoshitake Ohnishi, Naoko Wamme, and Jun-ichi Fujita -- Design and preliminary studies of environmentally enhanced water-castable, water-developable positive tone resists : model and feasibility studies / Jennifer M. Havard, Dario Pasini, Jean M.J. Fréchet, David Medeiros, Shintaro Yamada, and C. Grant Willson -- Molecular design for new positive electron-beam resists / Yukio Nagasaki -- The influence of structure on dissolution inhibition for novolac-based photoresists : adaption of the probabilistic approach / Christopher L. McAdams, Wang Yueh, Pavlos Tsiartas, Dale Hsieh, and C. Grant Willson -- Photoacid generating polymers for surface modification resists / Masamitsu Shirai, Mitsuho Masuda, Masahiro Tsunooka, Masayuki Endo, and Takahiro Matsuo -- Material design and development for aqueous base compatible high-performance deep UV negative-tone resists / Pushkara Rao Varanasi, Hiroshi Ito, Phil Brock, Gregory Breyta, William R. Brunsvold, and Ahmad D. Katnani -- Advanced chemically amplified resist process using non-ammonia generating adhesion promoter / M. Endo and A. Katsuyama -- Post-exposure bake kinetics in epoxy novolac-based chemically amplified resists / P. Argitis, S. Boyatzis, I. Raptis, N. Glezos, and M. Hatzakis -- Alkali-developable positive-photosensitive polyimide based on diazonaphthoquinone sensitizer / T. Ueno, Y. Okabe, T. Miwa, Y. Maekawa, and G. Rames-Langlade
Extent
1 online resource (xii, 386 p.)
Form of item
electronic
Isbn
9780841216884
Isbn Type
(ebook)
Other physical details
ill.
Specific material designation
remote
System control number
  • 3520812-01okla_normanlaw
  • (SIRSI)3520812
  • (Sirsi) o433052835
  • (OCoLC)433052835

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