The Resource Hf-based high-k dielectrics : process development, performance characterization, and reliability, Young-Hee Kim, Jack C. Lee, (electronic resource)

Hf-based high-k dielectrics : process development, performance characterization, and reliability, Young-Hee Kim, Jack C. Lee, (electronic resource)

Label
Hf-based high-k dielectrics : process development, performance characterization, and reliability
Title
Hf-based high-k dielectrics
Title remainder
process development, performance characterization, and reliability
Statement of responsibility
Young-Hee Kim, Jack C. Lee
Creator
Contributor
Subject
Language
eng
Member of
Additional physical form
Also available in print.
Cataloging source
WAU
http://library.link/vocab/creatorDate
1972-
http://library.link/vocab/creatorName
Kim, Young-Hee
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
Lee, Jack Chung-Yeung
Series statement
Synthesis lectures on solid state materials and devices
http://library.link/vocab/subjectName
  • Dielectrics
  • Hafnium oxide
  • Integrated circuits
  • Semiconductors
  • Breakdown (Electricity)
  • Metal oxide semiconductor field-effect transistors
Label
Hf-based high-k dielectrics : process development, performance characterization, and reliability, Young-Hee Kim, Jack C. Lee, (electronic resource)
Link
http://libraries.ou.edu/access.aspx?url=http://www.morganclaypool.com/doi/abs/10.2200/S00005ED1V01Y200508SSM001
Instantiates
Publication
Note
  • Title from PDF t.p. (viewed on Dec. 2, 2005)
  • Series statement from caption on home page
Bibliography note
Includes bibliographical references
Color
mixed
Dimensions
unknown
Edition
1st ed.
Extent
x, 92 p.
Form of item
electronic
Governing access note
Available to subscribers only
Isbn
9781598290042
Other physical details
digital, PDF file
Specific material designation
remote
System control number
  • 3034557-01okla_normanlaw
  • (SIRSI)3034557
  • (Sirsi) o62458047
  • (OCoLC)62458047
System details
  • System requirements: Adobe Acrobat Reader
  • Mode of access: World Wide Web
Label
Hf-based high-k dielectrics : process development, performance characterization, and reliability, Young-Hee Kim, Jack C. Lee, (electronic resource)
Link
http://libraries.ou.edu/access.aspx?url=http://www.morganclaypool.com/doi/abs/10.2200/S00005ED1V01Y200508SSM001
Publication
Note
  • Title from PDF t.p. (viewed on Dec. 2, 2005)
  • Series statement from caption on home page
Bibliography note
Includes bibliographical references
Color
mixed
Dimensions
unknown
Edition
1st ed.
Extent
x, 92 p.
Form of item
electronic
Governing access note
Available to subscribers only
Isbn
9781598290042
Other physical details
digital, PDF file
Specific material designation
remote
System control number
  • 3034557-01okla_normanlaw
  • (SIRSI)3034557
  • (Sirsi) o62458047
  • (OCoLC)62458047
System details
  • System requirements: Adobe Acrobat Reader
  • Mode of access: World Wide Web

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