The Resource Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition, R.A. Outlaw and P. Hopson, Jr, (microform)

Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition, R.A. Outlaw and P. Hopson, Jr, (microform)

Label
Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition
Title
Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition
Statement of responsibility
R.A. Outlaw and P. Hopson, Jr
Title variation
Growth of high quality thin film Ge single crystals by plasma-enhanced chemical vapor deposition
Creator
Contributor
Subject
Language
eng
Cataloging source
GPO
http://library.link/vocab/creatorName
Outlaw, R. A
Government publication
federal national government publication
Index
no index present
Literary form
non fiction
http://library.link/vocab/relatedWorkOrContributorName
  • Hopson, P
  • United States
Series statement
NASA technical paper
Series volume
2532
http://library.link/vocab/subjectName
  • Germanium
  • Growth
  • Crystals
  • Thin films
  • Vapor-plating
Label
Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition, R.A. Outlaw and P. Hopson, Jr, (microform)
Instantiates
Publication
Note
Distributed to depository libraries in microfiche
Extent
1 v.
Form of item
microfiche
Reproduction note
Microfiche.
Stock number
N 86-20586
System control number
  • 1162894-01okla_normanlaw
  • (SIRSI)1162894
  • (Sirsi) o33070152
  • (OCoLC)33070152
  • (GPO)95083783
Label
Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition, R.A. Outlaw and P. Hopson, Jr, (microform)
Publication
Note
Distributed to depository libraries in microfiche
Extent
1 v.
Form of item
microfiche
Reproduction note
Microfiche.
Stock number
N 86-20586
System control number
  • 1162894-01okla_normanlaw
  • (SIRSI)1162894
  • (Sirsi) o33070152
  • (OCoLC)33070152
  • (GPO)95083783

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